• DocumentCode
    512708
  • Title

    Parallel fabrication of photonic crystals (PC) using interference lithography for integrated waveguide-PC devices

  • Author

    Chincholi, A. ; Banerjee, S. ; Huang, J.S. ; Klotzkin, D.

  • Author_Institution
    Univ. Of Cincinnati, Cincinnati, OH, USA
  • fYear
    2005
  • fDate
    6-8 June 2005
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.
  • Keywords
    optical fabrication; photolithography; photonic crystals; integrated waveguide-PC devices; multiple exposure interference lithography; optical devices; parallel fabrication; photonic crystals; Interference; Lithography; Mirrors; Optical device fabrication; Optical interferometry; Optical waveguide theory; Optical waveguides; Personal communication networks; Photonic crystals; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Information Photonics, 2005. IP 2005. OSA Topical Meeting on
  • Conference_Location
    Charlotte, NC
  • Print_ISBN
    978-1-4244-6637-5
  • Type

    conf

  • Filename
    5411871
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=512708