DocumentCode :
513679
Title :
Dark-Current Analaysis of InGaAs-MSM-Photodetectors on Silicon Substrates
Author :
Wehmann, H.-H. ; Tang, G.P. ; Klockenbrink, R. ; Mo, S. ; Schlachetzki, A.
Author_Institution :
Institute for Semiconductor Technology, Technical University Braunschweig, P.O. Box 3329, D-38023 Braunschweig, Germany, IHT@TU-BS.DE
fYear :
1995
fDate :
25-27 Sept. 1995
Firstpage :
447
Lastpage :
450
Abstract :
The fabrication process of InGaAs metal-semiconductor-metal (MSM) photodetectors on lattice-mismatched (001)Si substrates is described. The Schottky-barrier is enhanced by a p+n-InP double layer. The dark-current densities measured are comparable to those of lattice-matched devices on InP. Their distribution shows the good reproducibility of the fabrication process. From the temperature and voltage dependence of the dark current we find that on Si the current in the medium voltage range is noticeably influenced by tunneling which we relate to defect centres in the bandgap. Nevertheless, the dark current is low enough for applications of the MSM-detectors in optoelectronic systems.
Keywords :
Dark current; Density measurement; Fabrication; Indium gallium arsenide; Indium phosphide; Photodetectors; Reproducibility of results; Silicon; Temperature dependence; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1995. ESSDERC '95. Proceedings of the 25th European
Conference_Location :
The Hague, The Netherlands
Print_ISBN :
286332182X
Type :
conf
Filename :
5435930
Link To Document :
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