New Optimization Strategy Combining Response Surface Model and Levenberg-Marquardt Methodes for Various Optimization Purposes

In this article we propose to use a combination of two optimization strategies, the Response Surface Model (RSM) method and the Levenberg-Marquardt (LM) method, for various optimization purposes in IC-technology. It is argued that both optimization techniques can be used complementary, combining the strenghts of both techniques while avoiding their weaknesses. As an illustration we apply this strategy to the calibration of a compact model for a lateral DMOST. We also show a CMOS TCAD example optimized with this strategy.