DocumentCode
513743
Title
A Dynamic Model of Gold/Platinum Doped Devices
Author
Valdinoci, M. ; Colalongo, L. ; Coffa, S. ; Rudan, M.
Author_Institution
UniversitÃ\xa0 di Bologna, viale Risorgimento, 2 - 40136 Bologna, Italy
fYear
1995
fDate
25-27 Sept. 1995
Firstpage
71
Lastpage
74
Abstract
Deep impurities like gold or platinum are extensively used in semiconductor technology to improve the switching characteristics of the devices by decreasing the carrier lifetimes. This, on the other hand, has the undesired effect of increasing the material resistivity. Here a complete model is presented, describing the effects of gold/platinum doping on both the steady-state and transient characteristics. While in steady-state the deep-impurity effects are accounted for by simply redefining the generation-recombination rate, in transient conditions two more continuity equations are necessary to account for the dynamic variation of the charge trapped by the deep levels. Such model is applied here to predict the switching of a platinum-doped diode and the increase in the bulk material resistivity, and shows good agreement with experimental results.
Keywords
Charge carrier lifetime; Conductivity; Equations; Gold; Platinum; Semiconductor device doping; Semiconductor impurities; Semiconductor materials; Semiconductor process modeling; Steady-state;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1995. ESSDERC '95. Proceedings of the 25th European
Conference_Location
The Hague, The Netherlands
Print_ISBN
286332182X
Type
conf
Filename
5436014
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