• DocumentCode
    513806
  • Title

    Mechanical Stress in and Surrounding CoSi2 and TiSi2 Lines

  • Author

    De Wolf, Ingrid ; Howard, David J. ; Maex, Karen ; Maes, Herman E.

  • Author_Institution
    IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
  • fYear
    1996
  • fDate
    9-11 Sept. 1996
  • Firstpage
    609
  • Lastpage
    612
  • Abstract
    In this paper, the local mechanical stress near arrays of silicide lines with different thicknesses, widths, and pitches is studied using micro-Raman spectroscopy. Different silicides are compared: CoSi, CoSi2, CoSi2 formed with Ti cap, CoSi2 formed with Ti interlayer, C49 TiSi2 and C54 TiSi2. The local phase of the latter two samples was also determined by Raman spectroscopy.
  • Keywords
    Compressive stress; Diodes; Frequency; Mechanical variables measurement; Raman scattering; Silicidation; Spectroscopy; Stress measurement; Substrates; Tensile stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
  • Conference_Location
    Bologna, Italy
  • Print_ISBN
    286332196X
  • Type

    conf

  • Filename
    5436133
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=513806