• DocumentCode
    513835
  • Title

    Measurement of Standard Deviation for Threshold Voltage using Parallel-Connected MOSFETs

  • Author

    Terada, Kazuo ; Mogami, Toru

  • Author_Institution
    Faculty of Information Sciences, Hiroshima City University, 151-5, Numata-cho-oozuka, Hiroshima, 731-31, Japan
  • fYear
    1996
  • fDate
    9-11 Sept. 1996
  • Firstpage
    499
  • Lastpage
    502
  • Abstract
    The test circuit, in which many same-structure MOSFETs are parallel-connected, is proposed for measuring the standard deviation for MOSFET threshold voltage. The threshold voltage, which is extracted from the drain-current vs. gate-voltage relation for this test circuit is different from the average value of those for the each individual MOSFETs included in this test circuit by the value depending on its standard deviation. By using this fact, the standard deviation for threshold voltage can easily be measured. This paper describes the measurement principle and confirms it, using IDS-VG relations for experimental MOSFETs.
  • Keywords
    Circuit testing; Data mining; Equations; Gain measurement; Integrated circuit measurements; MOSFETs; Measurement standards; Semiconductor device measurement; Threshold voltage; Time measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1996. ESSDERC '96. Proceedings of the 26th European
  • Conference_Location
    Bologna, Italy
  • Print_ISBN
    286332196X
  • Type

    conf

  • Filename
    5436179