Title :
Integrated Si/CoSi2/Si-Heterotransistors at High Current Densities
Author :
Uffmann, D. ; Adamski, C.
Author_Institution :
Institut fÿr Halbleitertechnologie and Laboratorium fÿr Informationstechnologie, Universitÿt Hannover, Appelstr. 11a, D-3000 Hannover, Germany
Abstract :
We have fabricated integrated Si/CoSi2/Si-heterotransistors by MBE. The commonbase current gain of the devices is correlated to pinhole size and density. The electrical behaviour is investigated up to an emitter current density of 6000A/cm2. A decrease of current gain at high current densities is observed for devices with higher pinhole density. For devices with lower pinhole density, space charge effects will lead to an increase of emitter-to-collector delay time at high current densities.
Keywords :
Contacts; Current density; Cutoff frequency; Microelectronics; Molecular beam epitaxial growth; Parasitic capacitance; Silicon; Temperature; Transconductance; Voltage;
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
