DocumentCode :
513923
Title :
Temperature dependence of DC characteristics of Si/SiGe heterojunction bipolar transistors
Author :
Martin, A.S.R. ; Gell, M.A. ; Reeder, A.A. ; Godfrey, D J ; Jones, M.E. ; Gibbings, C.J. ; Tuppen, C.G.
Author_Institution :
British Telecom Research Laboratories, Martlesham Heath, Ipswich, Suffolk, U.K.
fYear :
1990
fDate :
10-13 Sept. 1990
Firstpage :
473
Lastpage :
476
Abstract :
Silicon/silicon-germanium heterojunction bipolar transistors incorporating a strained layer of silicon - germanium alloy have been fabricated and their DC characteristics investigated over a wide range of temperatures (80 to 400K). The collector currents were typically found to be ideal over six orders of magnitude at room temperature. Nonideal behaviour observed below 180K is ascribed to surface recombination effects. The mechanisms associated with the nonideal behaviour of the base currents are discussed and the enhanced ideality seen towards 400K assigned to a reduced dominance of recombination mechanisms.
Keywords :
Boron; Breakdown voltage; Capacitors; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Numerical simulation; Random access memory; Silicon germanium; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location :
Nottingham, England
Print_ISBN :
0750300655
Type :
conf
Filename :
5436315
Link To Document :
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