Title :
Temperature dependence of DC characteristics of Si/SiGe heterojunction bipolar transistors
Author :
Martin, A.S.R. ; Gell, M.A. ; Reeder, A.A. ; Godfrey, D J ; Jones, M.E. ; Gibbings, C.J. ; Tuppen, C.G.
Author_Institution :
British Telecom Research Laboratories, Martlesham Heath, Ipswich, Suffolk, U.K.
Abstract :
Silicon/silicon-germanium heterojunction bipolar transistors incorporating a strained layer of silicon - germanium alloy have been fabricated and their DC characteristics investigated over a wide range of temperatures (80 to 400K). The collector currents were typically found to be ideal over six orders of magnitude at room temperature. Nonideal behaviour observed below 180K is ascribed to surface recombination effects. The mechanisms associated with the nonideal behaviour of the base currents are discussed and the enhanced ideality seen towards 400K assigned to a reduced dominance of recombination mechanisms.
Keywords :
Boron; Breakdown voltage; Capacitors; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Numerical simulation; Random access memory; Silicon germanium; Temperature dependence;
Conference_Titel :
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location :
Nottingham, England