DocumentCode
513923
Title
Temperature dependence of DC characteristics of Si/SiGe heterojunction bipolar transistors
Author
Martin, A.S.R. ; Gell, M.A. ; Reeder, A.A. ; Godfrey, D J ; Jones, M.E. ; Gibbings, C.J. ; Tuppen, C.G.
Author_Institution
British Telecom Research Laboratories, Martlesham Heath, Ipswich, Suffolk, U.K.
fYear
1990
fDate
10-13 Sept. 1990
Firstpage
473
Lastpage
476
Abstract
Silicon/silicon-germanium heterojunction bipolar transistors incorporating a strained layer of silicon - germanium alloy have been fabricated and their DC characteristics investigated over a wide range of temperatures (80 to 400K). The collector currents were typically found to be ideal over six orders of magnitude at room temperature. Nonideal behaviour observed below 180K is ascribed to surface recombination effects. The mechanisms associated with the nonideal behaviour of the base currents are discussed and the enhanced ideality seen towards 400K assigned to a reduced dominance of recombination mechanisms.
Keywords
Boron; Breakdown voltage; Capacitors; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Numerical simulation; Random access memory; Silicon germanium; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
Conference_Location
Nottingham, England
Print_ISBN
0750300655
Type
conf
Filename
5436315
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