• DocumentCode
    513923
  • Title

    Temperature dependence of DC characteristics of Si/SiGe heterojunction bipolar transistors

  • Author

    Martin, A.S.R. ; Gell, M.A. ; Reeder, A.A. ; Godfrey, D J ; Jones, M.E. ; Gibbings, C.J. ; Tuppen, C.G.

  • Author_Institution
    British Telecom Research Laboratories, Martlesham Heath, Ipswich, Suffolk, U.K.
  • fYear
    1990
  • fDate
    10-13 Sept. 1990
  • Firstpage
    473
  • Lastpage
    476
  • Abstract
    Silicon/silicon-germanium heterojunction bipolar transistors incorporating a strained layer of silicon - germanium alloy have been fabricated and their DC characteristics investigated over a wide range of temperatures (80 to 400K). The collector currents were typically found to be ideal over six orders of magnitude at room temperature. Nonideal behaviour observed below 180K is ascribed to surface recombination effects. The mechanisms associated with the nonideal behaviour of the base currents are discussed and the enhanced ideality seen towards 400K assigned to a reduced dominance of recombination mechanisms.
  • Keywords
    Boron; Breakdown voltage; Capacitors; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Numerical simulation; Random access memory; Silicon germanium; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1990. ESSDERC '90. 20th European
  • Conference_Location
    Nottingham, England
  • Print_ISBN
    0750300655
  • Type

    conf

  • Filename
    5436315