DocumentCode
513947
Title
Electrical and Optical Spectroscopic Characterization of Oxide Traps Induced by Hot Hole Injection
Author
Bourcerie, M. ; Marchetaux, J.-C. ; Boudou, A. ; Vuillaume, Dominique
Author_Institution
BULL S. A, Direction des technologies Avancées, 78340 Les Clayes sous bois, FRANCE.
fYear
1989
fDate
11-14 Sept. 1989
Firstpage
549
Lastpage
552
Abstract
For a better understanding of defects induced by hot carrier stressing in NMOS transistors, the effect of emission enhanced by electric field (Poole-Frenkel effect) and the photodepopulation spectroscopy are used to characterize the traps in the thin gate oxide.
Keywords
Charge carrier processes; Electron emission; Electron traps; Hot carriers; Ionization; Kinetic theory; MOS devices; Optical recording; Spectroscopy; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location
Berlin, Germany
Print_ISBN
0387510001
Type
conf
Filename
5436547
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