DocumentCode
514023
Title
Reliable, High Temperature Stable Schottk Contacts to GaAs Based on LaB6 Diffusion Barriers
Author
Wurfl, J. ; Singh, K.K. ; Hartnagel, H.L.
Author_Institution
TH Darmstadt, Institut fÿr Hochfrequenztechnik, Merckstr. 25, 6100 Darmstadt, FR Germany
fYear
1989
fDate
11-14 Sept. 1989
Firstpage
165
Lastpage
168
Abstract
The thermal stability of Au-LaB6 Schottky-diodes on n-GaAs has been investigated using I/V-measurements and XPS-analysis. The e-beam evaporated contact systems exhibit good electrical properties. It could be shown that the ideality factor and the barrier height improves after a certain annealing step and remains almost stable even after prolonged operation at 400°C. This demonstrates the suitability of lanthanum hexaboride to be used as a high temperature stable diffusion barrier in Au-LaB6 Schottky contacts to GaAs.
Keywords
Annealing; Contacts; Gallium arsenide; Gold; Lanthanum; Microelectronics; Schottky barriers; Schottky diodes; Temperature; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location
Berlin, Germany
Print_ISBN
0387510001
Type
conf
Filename
5436643
Link To Document