Interface State Analysis of Mosfets with a Modified Charge-Pumping Technique

In this paper we present a modified charge pumping technique to obtain the energy dependence of interface states of MOSFETs. The steps of gate potential shift periodically between 3 voltage levels. The duration of the gate-mid-level VGMID gives a precise control of the electron and hole emission times avoiding to generate and measure transition times of trape-zoidal pulses. Furthermore an extension of charge pumping measurements on chains of MOSFETs in parallel is realized. CV measurements at varactors of the same testchip are evaluated and compared to the results of the charge pumping technique.