• DocumentCode
    514682
  • Title

    A Software Method to Improve Resistance Measure Precision of Laser Trimming System

  • Author

    Zhi-juan, Wang ; Xiao-dong, Yan ; Yuan, Sun ; Xiao-bin, Zhao

  • Author_Institution
    Nat. Language Resource Monitoring & Res. Center Minority Languages Branch, Minzu Univ. of china, Beijing, China
  • Volume
    1
  • fYear
    2010
  • fDate
    6-7 March 2010
  • Firstpage
    586
  • Lastpage
    589
  • Abstract
    Laser Trimming System is an equipment to adjust the resistance of chip resistor accurately by laser trimming. The measure precision of resistance measure system affects the precision of resistance directly. In order to reduce the influence of the measure error coming from measure system, a software method based on Wheatstone bridge is introduced to compensate measure error of Laser Trimming System. With its simple principle, the method is easy to realize and has good circumstance adaptability. Through measuring and compensating the measure error of high-precision standard resistors, the compensating values of measure error are gained automatically. The measure error of all trimmed resistor can be reduced using these compensating values. If measure system has good stability and low fluctuating, its application can guarantee the following precision of measure system: ±0.50/00 (when R<100 ¿), ±0.20/00 (100 ¿ ¿ R < 1M ¿), ±20/00 (When R¿1 M ¿).
  • Keywords
    error compensation; laser beam machining; software engineering; Wheatstone bridge; error compensation; error measurement; laser trimming system; resistance measure system; software method; system precision; Electrical resistance measurement; Error correction; Gain measurement; Laser beam cutting; Laser theory; Measurement standards; Resistors; Semiconductor device measurement; Software measurement; Voltage; Laser Trimming System; compensating values of measure error; measure error; measure system;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Education Technology and Computer Science (ETCS), 2010 Second International Workshop on
  • Conference_Location
    Wuhan
  • Print_ISBN
    978-1-4244-6388-6
  • Electronic_ISBN
    978-1-4244-6389-3
  • Type

    conf

  • DOI
    10.1109/ETCS.2010.221
  • Filename
    5458744