Title :
High efficiency nonuniform grating coupler by utilizing the lag effect in the dry etching process
Author :
Tang, Yongbo ; Wang, Zhechao ; Westergren, Urban ; Wosinski, Lech
Author_Institution :
Dept. of Microelectron. & Appl. Phys., R. Inst. of Technol. (Sweden), Kista, Sweden
Abstract :
Utilizing the lag effect in dry etching, a nonuniform silicon-on-insulator grating coupler is designed and fabricated. Over 80% (>-1 dB) coupling efficiency is theoretically obtained and experimental coupling efficiency of 55% is achieved for TE polarization.
Keywords :
diffraction gratings; etching; integrated optics; light polarisation; optical couplers; optical design techniques; silicon-on-insulator; TE polarization; coupling efficiency; dry etching; lag effect; nonuniform grating coupler; nonuniform silicon-on-insulator; Coupling circuits; Dry etching; Gratings; Integrated optics; Microelectronics; Optical coupling; Optical fiber couplers; Optical refraction; Photonics; Silicon on insulator technology;
Conference_Titel :
Optical Fiber Communication (OFC), collocated National Fiber Optic Engineers Conference, 2010 Conference on (OFC/NFOEC)
Conference_Location :
San Diego, CA
Electronic_ISBN :
978-1-55752-884-1
