Title :
Compact Modelling of Submicron CMOS
Author :
Klaassen, D.B.M.
Author_Institution :
Philips Research Laboratories, Eindhoven, The Netherlands
Abstract :
The accuracy of present-day compact MOS models and relevant benchmark criteria are reviewed. The impact on compact modelling of new CMOS applications and the rapid progress in process technology towards dimensions of 0.1 micron, will be discussed.
Keywords :
Application software; Benchmark testing; CMOS integrated circuits; CMOS process; CMOS technology; Integrated circuit modeling; Integrated circuit technology; Semiconductor device modeling; Solid modeling; Temperature;
Conference_Titel :
Solid-State Circuits Conference, 1996. ESSCIRC '96. Proceedings of the 22nd European
Conference_Location :
Neuchatel, Switzerland
Print_ISBN :
2-86332-197-8
