• DocumentCode
    51723
  • Title

    Reliable Operation of SiC JFET Subjected to Over 2.4 Million 1200-V/115-A Hard Switching Events at 150 ^{\\circ}\\hbox {C}

  • Author

    Veliadis, Victor ; Steiner, B. ; Lawson, Kevin ; Bayne, Stephen B. ; Urciuoli, Damian ; Ha, H.C. ; El-Hinnawy, Nabil ; Gupta, Swastik ; Borodulin, Pavel ; Howell, Robert S. ; Scozzie, Charles

  • Author_Institution
    Northrop Grumman Electron. Syst., Linthicum, MD, USA
  • Volume
    34
  • Issue
    3
  • fYear
    2013
  • fDate
    Mar-13
  • Firstpage
    384
  • Lastpage
    386
  • Abstract
    A requirement for the commercialization of power SiC transistors is their long-term reliable operation under hard switching conditions and high temperatures encountered in the field. Normally ON 1200-V vertical-channel implanted-gate SiC JFETs, designed for high-power bidirectional (four-quadrant) solid-state circuit breaker applications, were repetitively pulsed hard switched at 150°C from a 1200-V blocking state to an on-state current of 115 A, which is in excess of 13 times the JFET´s 250-W/cm2 rated current at 150°C. The JFETs were fabricated in seven photolithographic levels with a single masked ion implantation forming the p+ gates and guard rings and with no epitaxial regrowth. The pulsed testing was performed using a low-inductance RLC circuit. In this circuit, the energy initially stored in a capacitor is discharged in a load resistor through the JFET under test. The JFET hard switch stressing included over 2.4 million 1200-V/115-A hard switch events at 150°C and at a repetition rate of 10 Hz. The peak energies and powers dissipated by the JFET at each hard switch event were 73.2 mJ and 68.2 kW, respectively. The current rise rate was 166 A/μs, and the pulse FWHM was 1.8 μs. After over 2.4 million hard switch events at 150°C, the JFET blocking voltage characteristics remained unchanged while the on-state current conduction slightly improved, which indicate reliable operation.
  • Keywords
    RLC circuits; circuit breakers; epitaxial growth; field effect transistor switches; inductance; integrated circuit reliability; integrated circuit testing; ion implantation; photolithography; resistors; silicon compounds; wide band gap semiconductors; JFET blocking voltage characteristics; JFET hard switch stress; JFET under test; ON-state current conduction; SiC; blocking state; capacitor storage; current 115 A; guard rings; hard switch event; hard switch events; hard switching conditions; hard switching events; high-power bidirectional solid-state circuit breaker applications; load resistor; long-term reliable operation; low-inductance RLC circuit; p+ gates; peak energies; photolithographic levels; power 68.2 kW; power dissipation; power transistors commercialization; pulse FWHM; reliable operation; single masked ion implantation; temperature 150 degC; vertical-channel implanted-gate JFET; voltage 1200 V; JFETs; Logic gates; RLC circuits; Reliability; Silicon carbide; Switches; Switching circuits; 1200 V; Bidirectional; JFET; SiC; fault isolation; four quadrants; hard switching; high temperature; high voltage; normally ON (N-ON); pulsing; reliability; solid-state circuit breaker (SSCB);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2013.2241724
  • Filename
    6459530