DocumentCode :
519944
Title :
Wafer-scale monolithic integration of Al2O3:Er3+ Amplifiers with si waveguides
Author :
Agazzi, L. ; Bradley, J.D.B. ; Roelkens, G. ; Baets, R. ; Ay, F. ; Wörhoff, K. ; Pollnau, M.
Author_Institution :
Integrated Opt. Microsyst. Group, Univ. of Twente, Enschede, Netherlands
fYear :
2010
fDate :
16-21 May 2010
Firstpage :
1
Lastpage :
2
Abstract :
Co-sputtering and structuring active erbium-doped aluminum oxide waveguides directly on top of processed SOI passive waveguides provides coupling losses of 2.5 dB between active and passive waveguides and a signal enhancement of 7.2 dB.
Keywords :
aluminium compounds; erbium; integrated optics; optical waveguides; silicon; silicon-on-insulator; Al2O3:Er3+; SOI; amplifiers; cosputtering; wafer scale monolithic integration; waveguides; Aluminum oxide; Couplers; Integrated optics; Monolithic integrated circuits; Optical refraction; Optical variables control; Optical waveguides; Propagation losses; Silicon; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-890-2
Electronic_ISBN :
978-1-55752-890-2
Type :
conf
Filename :
5499502
Link To Document :
بازگشت