Title :
Observation of ArF laser induced structural defects in highly transparent synthetic silica glass
Author :
Ono, M. ; Koike, A. ; Iwata, K. ; Takata, M.
Author_Institution :
Asahi Glass Co. Ltd., Yokohama, Japan
Abstract :
Sensitive in-situ measurement systems for differential absorption and photoluminescence were developed to evaluate E´ center, ODC(II), and NBOHC. The change of their concentrations by ArF irradiation were successfully observed in highly transparent synthetic silica glass.
Keywords :
argon compounds; gas lasers; glass; laser beam effects; silicon compounds; ArF; E´ center; SiO2; highly transparent synthetic silica glass; laser induced structural defect; light absorption; nonbridging hole center; oxygen deficiency center; photoluminescence; Amorphous materials; Electromagnetic wave absorption; Glass; Lamps; Optical materials; Optical scattering; Optical sensors; Photoluminescence; Semiconductor materials; Silicon compounds;
Conference_Titel :
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-890-2
Electronic_ISBN :
978-1-55752-890-2
