DocumentCode
520023
Title
Table-top extreme ultraviolet laser aerial imaging of lithographic masks
Author
Brizuela, Fernando ; Carbajo, Sergio ; Sakdinawat, Anne ; Wang, Yong ; Alessi, David ; Martz, Dale ; Luther, Bradley ; Goldberg, Kenneth ; Attwood, David ; La Fontaine, Bruno ; Rocca, Jorge ; Menoni, Carmen
Author_Institution
Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO, USA
fYear
2010
fDate
16-21 May 2010
Firstpage
1
Lastpage
2
Abstract
We report the first at-wavelength line edge roughness measurements of patterned EUV lithography masks realized using a table-top aerial imaging system based on a table-top λ = 13.2 laser.
Keywords
masks; measurement by laser beam; ultraviolet lithography; aerial imaging; at-wavelength line edge roughness measurements; lithographic masks; patterned EUV lithography masks; table top extreme ultraviolet laser; wavelength 13.2 nm; Computer aided manufacturing; Gratings; Lighting; Lithography; Optical imaging; Optical microscopy; Optical reflection; Ultraviolet sources; X-ray imaging; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Conference_Location
San Jose, CA
Print_ISBN
978-1-55752-890-2
Electronic_ISBN
978-1-55752-890-2
Type
conf
Filename
5499581
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