• DocumentCode
    520450
  • Title

    Fabrication of photonic crystals with sub-100 nm features using multiphoton lithography with pre-swollen resins

  • Author

    Chen, Vincent W. ; Jarnagin, Nathan D. ; Perry, Joseph W.

  • Author_Institution
    Sch. of Chem. & Biochem., Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2010
  • fDate
    16-21 May 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Pre-swelling of resins has allowed the fabrication of photonic crystals with linewidths below 100 nm using multiphoton lithography at 730 nm. The resulting polymer photonic crystals show stop-band reflectivities over 70% at ∼1.8 µm.
  • Keywords
    Lithography; Optical device fabrication; Optical reflection; Personal communication networks; Photonic crystals; Polymers; Reflectivity; Resins; Resists; Scanning electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
  • Conference_Location
    San Jose, CA, USA
  • Print_ISBN
    978-1-55752-890-2
  • Electronic_ISBN
    978-1-55752-890-2
  • Type

    conf

  • Filename
    5500029
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=520450