DocumentCode :
520980
Title :
Laser produced plasma light sources for EUV lithography
Author :
La Fontaine, Bruno
Author_Institution :
Cymer Inc., San Diego, CA, USA
fYear :
2010
fDate :
16-21 May 2010
Firstpage :
1
Lastpage :
2
Abstract :
We present the latest results on high-power extreme-ultraviolet (EUV) light sources for lithography. This includes operation of high-power pulsed CO2 lasers, high repetition-rate Sn droplet targets, and collection of EUV light using multilayer-coated optics.
Keywords :
gas lasers; optical multilayers; ultraviolet lithography; CO2 lasers; EUV lithography; high power extreme ultraviolet light sources; laser produced plasma light sources; multilayer coated optics; Gas lasers; Light sources; Lithography; Optical pulse generation; Optical pulses; Plasma sources; Semiconductor device manufacture; Semiconductor lasers; Tin; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-890-2
Electronic_ISBN :
978-1-55752-890-2
Type :
conf
Filename :
5500584
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=520980
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