• DocumentCode
    520980
  • Title

    Laser produced plasma light sources for EUV lithography

  • Author

    La Fontaine, Bruno

  • Author_Institution
    Cymer Inc., San Diego, CA, USA
  • fYear
    2010
  • fDate
    16-21 May 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We present the latest results on high-power extreme-ultraviolet (EUV) light sources for lithography. This includes operation of high-power pulsed CO2 lasers, high repetition-rate Sn droplet targets, and collection of EUV light using multilayer-coated optics.
  • Keywords
    gas lasers; optical multilayers; ultraviolet lithography; CO2 lasers; EUV lithography; high power extreme ultraviolet light sources; laser produced plasma light sources; multilayer coated optics; Gas lasers; Light sources; Lithography; Optical pulse generation; Optical pulses; Plasma sources; Semiconductor device manufacture; Semiconductor lasers; Tin; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-55752-890-2
  • Electronic_ISBN
    978-1-55752-890-2
  • Type

    conf

  • Filename
    5500584
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=520980