• DocumentCode
    521169
  • Title

    Extraordinary low transmission of a metamaterial for application in lithography

  • Author

    Dobmann, S. ; Ploss, D. ; Reibold, D. ; Erdmann, A. ; Peschel, U.

  • Author_Institution
    Max Planck Inst. for the Sci. of Light, Erlangen, Germany
  • fYear
    2010
  • fDate
    16-21 May 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We present experiments on a metamaterial made from an ultrathin (< 40 nm) metal film. It exhibits extraordinary low transmission due to an antenna resonance and may form building blocks of future lithographic masks.
  • Keywords
    Antenna measurements; Lithography; Metamaterials; Optical films; Optical polarization; Plasmons; Resonance; Scanning electron microscopy; Transmitting antennas; Wavelength measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
  • Conference_Location
    San Jose, CA, USA
  • Print_ISBN
    978-1-55752-890-2
  • Electronic_ISBN
    978-1-55752-890-2
  • Type

    conf

  • Filename
    5500780
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=521169