DocumentCode
521659
Title
The Surface Layer of Fused Silica Finished by Various Polishing Techniques
Author
Li, Yaguo ; Liu, Zhichao ; Xie, Ruiqing ; Wang, Jian ; Xu, Qiao
Author_Institution
Fine Opt. Eng. Res. Center, Chengdu, China
fYear
2010
fDate
19-21 June 2010
Firstpage
1
Lastpage
6
Abstract
Our recent experiments show that the surface layer of fused silica manufactured by the magnetorheological finishing (MRF) is different from those finished by conventional polishing technique (e.g. pitch polishing or polyurethane polishing) in mechanical properties. We examined the hardness of the surface layer on fused silica polished by pitch/pad polishing and MRF respectively, and the results indicate that the hardness of traditionally polished layer is smaller than bulk material, decreasing with the distance from the sample surface, while the nanohardness of MRF-manufactured sample is greater than bulk, gradually increasing to the bulk value. We attribute the differences to the unique material removal mechanism of MRF. The distinctions among these polishing techniques may make contribution to varied laser-induced breakdown topography.
Keywords
hardness; magnetorheology; polishing; silicon compounds; surface finishing; SiO2; fused silica; hardness; magnetorheological finishing; nanohardness; pitch-pad polishing; polishing; surface layer; Etching; Hafnium; Magnetic materials; Optical materials; Organic materials; Silicon compounds; Solvents; Surface finishing; Surface topography; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics and Optoelectronic (SOPO), 2010 Symposium on
Conference_Location
Chengdu
Print_ISBN
978-1-4244-4963-7
Electronic_ISBN
978-1-4244-4964-4
Type
conf
DOI
10.1109/SOPO.2010.5504288
Filename
5504288
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