• DocumentCode
    521659
  • Title

    The Surface Layer of Fused Silica Finished by Various Polishing Techniques

  • Author

    Li, Yaguo ; Liu, Zhichao ; Xie, Ruiqing ; Wang, Jian ; Xu, Qiao

  • Author_Institution
    Fine Opt. Eng. Res. Center, Chengdu, China
  • fYear
    2010
  • fDate
    19-21 June 2010
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Our recent experiments show that the surface layer of fused silica manufactured by the magnetorheological finishing (MRF) is different from those finished by conventional polishing technique (e.g. pitch polishing or polyurethane polishing) in mechanical properties. We examined the hardness of the surface layer on fused silica polished by pitch/pad polishing and MRF respectively, and the results indicate that the hardness of traditionally polished layer is smaller than bulk material, decreasing with the distance from the sample surface, while the nanohardness of MRF-manufactured sample is greater than bulk, gradually increasing to the bulk value. We attribute the differences to the unique material removal mechanism of MRF. The distinctions among these polishing techniques may make contribution to varied laser-induced breakdown topography.
  • Keywords
    hardness; magnetorheology; polishing; silicon compounds; surface finishing; SiO2; fused silica; hardness; magnetorheological finishing; nanohardness; pitch-pad polishing; polishing; surface layer; Etching; Hafnium; Magnetic materials; Optical materials; Organic materials; Silicon compounds; Solvents; Surface finishing; Surface topography; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Optoelectronic (SOPO), 2010 Symposium on
  • Conference_Location
    Chengdu
  • Print_ISBN
    978-1-4244-4963-7
  • Electronic_ISBN
    978-1-4244-4964-4
  • Type

    conf

  • DOI
    10.1109/SOPO.2010.5504288
  • Filename
    5504288