DocumentCode :
521659
Title :
The Surface Layer of Fused Silica Finished by Various Polishing Techniques
Author :
Li, Yaguo ; Liu, Zhichao ; Xie, Ruiqing ; Wang, Jian ; Xu, Qiao
Author_Institution :
Fine Opt. Eng. Res. Center, Chengdu, China
fYear :
2010
fDate :
19-21 June 2010
Firstpage :
1
Lastpage :
6
Abstract :
Our recent experiments show that the surface layer of fused silica manufactured by the magnetorheological finishing (MRF) is different from those finished by conventional polishing technique (e.g. pitch polishing or polyurethane polishing) in mechanical properties. We examined the hardness of the surface layer on fused silica polished by pitch/pad polishing and MRF respectively, and the results indicate that the hardness of traditionally polished layer is smaller than bulk material, decreasing with the distance from the sample surface, while the nanohardness of MRF-manufactured sample is greater than bulk, gradually increasing to the bulk value. We attribute the differences to the unique material removal mechanism of MRF. The distinctions among these polishing techniques may make contribution to varied laser-induced breakdown topography.
Keywords :
hardness; magnetorheology; polishing; silicon compounds; surface finishing; SiO2; fused silica; hardness; magnetorheological finishing; nanohardness; pitch-pad polishing; polishing; surface layer; Etching; Hafnium; Magnetic materials; Optical materials; Organic materials; Silicon compounds; Solvents; Surface finishing; Surface topography; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics and Optoelectronic (SOPO), 2010 Symposium on
Conference_Location :
Chengdu
Print_ISBN :
978-1-4244-4963-7
Electronic_ISBN :
978-1-4244-4964-4
Type :
conf
DOI :
10.1109/SOPO.2010.5504288
Filename :
5504288
Link To Document :
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