The Effect of the Laser Interference Lithography Patterns When Substrate Tilted

Author

Zhao, Xiaoxia ; Wang, Hongying ; Xie, Yongjun ; Fan, Wenhui

Author_Institution

Phys. Dept., Xi´´an Univ. of Arts & Sci., Xi´´an, China

fYear

2010

fDate

19-21 June 2010

Firstpage

1

Lastpage

3

Abstract

The effect of the tilted substrate on the lithography patterns in maskless Laser Interference Lithography (MLIL) was numerically and experimentally studied. The experiments showed that the period of interference patterns becomes larger with increasing tilt angles of the substrate, as is in good agreement with theoretical analysis. It was also shown that there is no evident change when the rotational angle was less than 3 degree in our experiment. The significance of our analytical results for MLIL and the fabrication of integrated circuit was discussed.

Keywords

integrated circuit manufacture; laser materials processing; light interference; photolithography; integrated circuit fabrication; interference patterns; maskless laser interference lithography patterns; rotational angle; tilt angle; tilted substrate; Art; Frequency; Integrated circuit technology; Interference; Laser beams; Laser theory; Lithography; Optical device fabrication; Optical recording; Pattern analysis;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics and Optoelectronic (SOPO), 2010 Symposium on

Conference_Location

Chengdu

Print_ISBN

978-1-4244-4963-7

Electronic_ISBN

978-1-4244-4964-4

Type

conf

DOI

10.1109/SOPO.2010.5504313

Filename

5504313