Title :
The Effect of the Laser Interference Lithography Patterns When Substrate Tilted
Author :
Zhao, Xiaoxia ; Wang, Hongying ; Xie, Yongjun ; Fan, Wenhui
Author_Institution :
Phys. Dept., Xi´´an Univ. of Arts & Sci., Xi´´an, China
Abstract :
The effect of the tilted substrate on the lithography patterns in maskless Laser Interference Lithography (MLIL) was numerically and experimentally studied. The experiments showed that the period of interference patterns becomes larger with increasing tilt angles of the substrate, as is in good agreement with theoretical analysis. It was also shown that there is no evident change when the rotational angle was less than 3 degree in our experiment. The significance of our analytical results for MLIL and the fabrication of integrated circuit was discussed.
Keywords :
integrated circuit manufacture; laser materials processing; light interference; photolithography; integrated circuit fabrication; interference patterns; maskless laser interference lithography patterns; rotational angle; tilt angle; tilted substrate; Art; Frequency; Integrated circuit technology; Interference; Laser beams; Laser theory; Lithography; Optical device fabrication; Optical recording; Pattern analysis;
Conference_Titel :
Photonics and Optoelectronic (SOPO), 2010 Symposium on
Conference_Location :
Chengdu
Print_ISBN :
978-1-4244-4963-7
Electronic_ISBN :
978-1-4244-4964-4
DOI :
10.1109/SOPO.2010.5504313
