• DocumentCode
    524145
  • Title

    On leakage currents: sources and reduction for transistors, gates, memories and digital systems

  • Author

    Nebel, Wolfgang ; Helms, Domenik

  • Author_Institution
    University of Oldenburg, Oldenurg, Germany
  • fYear
    2008
  • fDate
    11-13 Aug. 2008
  • Firstpage
    349
  • Lastpage
    350
  • Abstract
    In only 5 years, leakage developed from an academic corner phenomenon to a central problem of embedded system design. In sub 90nm designs the leakage power is already exceeding the dynamic power. The intention of this tutorial is to first review the mechanisms causing leakage and the parameters and imperfections causing leakage variation as the dependencies on physical parameters as temperature, voltage levels, device geometry, doping levels, etc. Afterwards, the state-of-the-art in leakage reduction and management methodologies is presented with a first focus on transistor design including well engineering, high-k, strained silicon, SGOI devices, fully depleted ultra thin body SOI, as well as FinFETs. Then, technical aspects on the leakage management techniques power gating, body and supply voltage scaling and minimum leakage vector are discussed. Finally, low leakage SRAM cell design and different cache decay techniques are presented.
  • Keywords
    Design engineering; Digital systems; Doping; Embedded system; Engineering management; Geometry; Leakage current; Power engineering and energy; Temperature dependence; Voltage; PTV variation; SRAM leakage; dynamic leakage management; leakage current; transistor engineering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Low Power Electronics and Design (ISLPED), 2008 ACM/IEEE International Symposium on
  • Conference_Location
    Bangalore, India
  • Print_ISBN
    978-1-4244-8634-2
  • Electronic_ISBN
    978-1-60558-109-5
  • Type

    conf

  • DOI
    10.1145/1393921.1394014
  • Filename
    5529088