DocumentCode :
524145
Title :
On leakage currents: sources and reduction for transistors, gates, memories and digital systems
Author :
Nebel, Wolfgang ; Helms, Domenik
Author_Institution :
University of Oldenburg, Oldenurg, Germany
fYear :
2008
fDate :
11-13 Aug. 2008
Firstpage :
349
Lastpage :
350
Abstract :
In only 5 years, leakage developed from an academic corner phenomenon to a central problem of embedded system design. In sub 90nm designs the leakage power is already exceeding the dynamic power. The intention of this tutorial is to first review the mechanisms causing leakage and the parameters and imperfections causing leakage variation as the dependencies on physical parameters as temperature, voltage levels, device geometry, doping levels, etc. Afterwards, the state-of-the-art in leakage reduction and management methodologies is presented with a first focus on transistor design including well engineering, high-k, strained silicon, SGOI devices, fully depleted ultra thin body SOI, as well as FinFETs. Then, technical aspects on the leakage management techniques power gating, body and supply voltage scaling and minimum leakage vector are discussed. Finally, low leakage SRAM cell design and different cache decay techniques are presented.
Keywords :
Design engineering; Digital systems; Doping; Embedded system; Engineering management; Geometry; Leakage current; Power engineering and energy; Temperature dependence; Voltage; PTV variation; SRAM leakage; dynamic leakage management; leakage current; transistor engineering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Low Power Electronics and Design (ISLPED), 2008 ACM/IEEE International Symposium on
Conference_Location :
Bangalore, India
Print_ISBN :
978-1-4244-8634-2
Electronic_ISBN :
978-1-60558-109-5
Type :
conf
DOI :
10.1145/1393921.1394014
Filename :
5529088
Link To Document :
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