• DocumentCode
    525128
  • Title

    Measurement of thickness and electrophysical parameters of nanometer films by means of optical and microwave methods

  • Author

    Usanov, D.A. ; Skripal, Al V. ; Skripal, An V. ; Abramov, A.V. ; Bogolubov, A.S. ; Bakouie, A.

  • Author_Institution
    Dept. of Solid State Phys., Saratov State Univ. named after N.G. Tchernyshevsky, Saratov, Russia
  • fYear
    2010
  • fDate
    14-16 June 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The possibility to determine the thickness and electrophysical parameters of thin nanometer dielectric and metal films in sandwich-like structures using the results of measurement of reflection and transmission spectra in microwave and optical band has been shown. The results of measurement of refractive index of SnO2 in the thicknesses range from 40 nm to 2.8 mkm and the results of measurement of conductivity of Cr-films applied to ceramic substrates are presented.
  • Keywords
    Conductivity measurement; Dielectric measurements; Dielectric thin films; Microwave measurements; Microwave theory and techniques; Optical films; Optical reflection; Optical refraction; Optical variables control; Thickness measurement; Nanometer films; electrical conductivity; microwave and optical measurements; thickness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Radar and Wireless Communications (MIKON), 2010 18th International Conference on
  • Conference_Location
    Vilnius, Lithuania
  • Print_ISBN
    978-1-4244-5288-0
  • Type

    conf

  • Filename
    5540626
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=525128