• DocumentCode
    525864
  • Title

    Narrow-pitch n-channel superjunction UMOSFET for 40–60 V automotive application

  • Author

    Kawashima, Yoshiya ; Inomata, Hisao ; Murakawa, Koichi ; Miura, Yoshinao

  • Author_Institution
    Power Device Technol. Dept., Renesas Electron. Corp., Kawasaki, Japan
  • fYear
    2010
  • fDate
    6-10 June 2010
  • Firstpage
    329
  • Lastpage
    332
  • Abstract
    We report on ultra-low on-resistance 40-60 V-class n-channel superjunction UMOSFET (SJ-UMOS) with sufficient robustness for automotive applications. In the newly developed SJ-UMOS, we design a leading minimal pitch SJ structures with sub-micron wide p-type regions fabricated by high-energy multiple ion implantations of boron. This structure drastically improves the tradeoff between on-resistance and breakdown voltage (VB), which has limited the performance of conventional SJ-UMOS. Record low specific on-resistance (RSP) of 9.1 mΩmm2 and 16.1 mΩmm2 (VGS = 10 V) are obtained for VB of 44.8 V and 61.0 V, respectively. We also confirm high avalanche immunity for the chips showing the best performance.
  • Keywords
    MOSFET; automotive components; electric breakdown; low-power electronics; automotive application; breakdown voltage; high-energy multiple ion implantations; narrow-pitch n-channel superjunction UMOSFET; on-resistance; voltage 40 V to 60 V; Automobiles; Automotive applications; Boron; Impurities; Ion implantation; Low voltage; MOSFETs; Power semiconductor devices; Robustness; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's (ISPSD), 2010 22nd International Symposium on
  • Conference_Location
    Hiroshima
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4244-7718-0
  • Electronic_ISBN
    1943-653X
  • Type

    conf

  • Filename
    5543879