DocumentCode :
525878
Title :
Advanced RFC technology with new cathode structure of field limiting rings for High Voltage planar diode
Author :
Nakamura, Katsumi ; Masuoka, Fumihito ; Nishii, Akito ; Sadamatsu, Koji ; Kitajima, Soichi ; Hatade, Kazunari
Author_Institution :
Power Device Works, Mitsubishi Electr. Corp. Fukuoka, Fukuoka, Japan
fYear :
2010
fDate :
6-10 June 2010
Firstpage :
133
Lastpage :
136
Abstract :
The edge of the active area and termination structure have a decisive influence on the recovery safety operating area (SOA) of High Voltage (HV) freewheeling diodes (FWDs). We have investigated the HV planar anode diode that breaks the triangle trade-off limitations between the overall loss, the reverse recovery softness and the recovery SOA. Our results show the destruction phenomena during the recovery operation for HV diodes originate in the local heating caused by high electric field and high current density at the end of the active area. Therefore, a newly developed HV diode based on the Relaxed Field of Cathode (RFC) technology achieves high total performance by adopting a new cathode structure of the field limiting rings region. The new diode offers low overall loss combined with a high recovery SOA and superior snap-off capability. The proposed new diode structure demonstrates a clear triangle trade-off breakthrough between the overall loss, the reverse softness and the recovery SOA of the HV diode.
Keywords :
cathodes; current density; electric fields; low-power electronics; semiconductor diodes; HV planar anode diode; RFC technology; active area; cathode structure; current density; electric field; field limiting rings; freewheeling diodes; high voltage planar diode; recovery SOA; recovery softness; relaxed field of cathode; safety operating area; termination structure; Analytical models; Anodes; Cathodes; Current density; Insulated gate bipolar transistors; Performance loss; Power semiconductor devices; Semiconductor diodes; Semiconductor optical amplifiers; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2010 22nd International Symposium on
Conference_Location :
Hiroshima
ISSN :
1943-653X
Print_ISBN :
978-1-4244-7718-0
Electronic_ISBN :
1943-653X
Type :
conf
Filename :
5543964
Link To Document :
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