DocumentCode :
525891
Title :
A new 8V – 60V rated low Vgs NLDMOS structure with enhanced specific on-resistance
Author :
Ko, Choul-Joo ; Cho, Cheol-Ho ; Lee, Hee-Bae ; Lee, Yong-Jun ; Kim, Min-Woo ; Bang, Sun-Kyung ; Kim, Han-Geon ; Lee, Jae-O ; Shim, Sang-Chul ; Kang, Sun Kyoung ; Kim, Nam-Joo ; Yoo, Kwang-Dong ; Hutter, Lou N.
Author_Institution :
Analog Foundry Process Dev. Team, Dongbu Hitek, Bucheon, South Korea
fYear :
2010
fDate :
6-10 June 2010
Firstpage :
245
Lastpage :
248
Abstract :
We present a new 0.35um BCDMOS technology with a capability of 8 to 60V NLDMOS. The proposed process do not need level shifter, charge pump and boost up due to the same gate oxide thickness with logic 5V CMOS. And the Rsp of the proposed 24V NLDMOS structure is lower by 46% than conventional structure. The process has no thermal budget modification but use simple additional implant step. Also it is compatible with the conventional BCDMOS. The power LDMOS transistors in the process have very competitive performances with NLDMOS in 0.15 - 0.25um BCDMOS technologies.
Keywords :
CMOS integrated circuits; power transistors; BCDMOS technology; NLDMOS structure; logic CMOS; power LDMOS transistors; size 0.15 mum to 0.25 mum; size 0.35 mum; specific on-resistance enhancement; voltage 5 V; voltage 8 V to 60 V; CMOS integrated circuits; CMOS logic circuits; CMOS process; CMOS technology; Charge pumps; Doping; Driver circuits; Implants; Power semiconductor devices; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2010 22nd International Symposium on
Conference_Location :
Hiroshima
ISSN :
1943-653X
Print_ISBN :
978-1-4244-7718-0
Electronic_ISBN :
1943-653X
Type :
conf
Filename :
5543978
Link To Document :
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