Title :
1200 V, 35 A SiC-BGSIT with improved blocking gain of 480
Author :
Tanaka, Yasunori ; Takatsuka, Akio ; Yatsuo, Tsutomu ; Arai, Kazuo ; Yano, Koji
Author_Institution :
Energy Semicond. Electron. Res. Lab., Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
Abstract :
We succeeded to fabricate SiC buried gate static induction transistors (BGSITs) with the current rating of 35 A at the power density of 200 W/cm2. The saturation current exceeded 130 A. The breakdown voltage VBR and the on-resistance Ron were 1200 V at the gate voltage VG of -2.5 V and 26 mΩ at VG of +2.5 V, respectively. The blocking gain of 480 was greatly improved compared with our previous work (~100) due to the optimization of the fabrication process, especially related to the channel formation. Considering the active area A of 6.76 mm2, we calculated the specific on-resistance RonA as 1.8 mΩ·cm2, which is a lowest one among the SiC switching devices with VBR>1200 V that have been reported up to now except our previous report on small chip BGSIT (A=0.853 mm2). The leakage current was less than 10-7 A at the drain voltage of 1000 V at room temperature and increased by only one order of magnitude at 200°C. The Ron increased from 26 mil at RT to 74 mΩ at 200°C.
Keywords :
leakage currents; silicon compounds; static induction transistors; BGSIT; SiC; blocking gain; breakdown voltage; buried gate static induction transistors; channel formation; current 35 A; leakage current; saturation current; temperature 200 degC; temperature 293 K to 298 K; voltage 1000 V; voltage 1200 V; Electronics industry; FETs; Fabrication; JFETs; Laboratories; MOSFETs; Power semiconductor devices; Silicon carbide; Textile industry; Voltage;
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2010 22nd International Symposium on
Conference_Location :
Hiroshima
Print_ISBN :
978-1-4244-7718-0
Electronic_ISBN :
1943-653X