Title :
Improvement the light extraction efficiencies with patterned sapphire substrates by wet and ICP etching method
Author :
Wu, Chan-Shou ; Liang, Tsair-Chun ; Cheng, Wei-Chih ; Huang, Shun-Yuan ; Kuan, Hon
Author_Institution :
Grad. Inst. of Electro-Opt. Eng., Nat. Kaohsiung First Univ. of Sci. & Technol., Kaohsiung, Taiwan
Abstract :
In this study, sapphire substrates patterned by a selective chemical wet and an inductively coupled plasma (ICP) etching technique was proposed to improve the performance of GaN-based light-emitting diodes (LEDs). The light output power of LEDs on ICP-etching patterned substrates was better than the LED on wet-etching patterned substrates about 17%.
Keywords :
optoelectronic devices; sapphire; sputter etching; substrates; wetting; Al2O3; ICP etching method; etching technique; inductively coupled plasma; light extraction; light-emitting diodes; patterned sapphire substrates; wet etching; Etching; Iterative closest point algorithm; Light emitting diodes; Power generation; Resists; Substrates;
Conference_Titel :
OptoElectronics and Communications Conference (OECC), 2010 15th
Conference_Location :
Sapporo
Print_ISBN :
978-1-4244-6785-3
