DocumentCode :
528374
Title :
Trench structure metal-oxide-semiconductor (MOS) solar cells with oxides prepared by anodization technique
Author :
Wang, Chih-Yao ; Hwu, Jenn-Gwo
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
2010
fDate :
5-9 July 2010
Firstpage :
366
Lastpage :
367
Abstract :
This work presented the new trench structure of MOS solar cell with efficiency improved by the trap-assisted centers built on the side wall as the extra current path. The perimeter of electrode is critical for MOS solar cell.
Keywords :
MIS devices; anodisation; solar cells; MOS; anodization; electrode perimeter; metal-oxide-semiconductor solar cells; trap-assisted centers; trench structure solar cells; Current density; Electrodes; Insulators; Logic gates; Photovoltaic cells; Semiconductor device measurement; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
OptoElectronics and Communications Conference (OECC), 2010 15th
Conference_Location :
Sapporo
Print_ISBN :
978-1-4244-6785-3
Type :
conf
Filename :
5588586
Link To Document :
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