DocumentCode :
530940
Title :
Temperature dependent degradation modes in AlGaN/GaN HEMTs
Author :
Douvry, Y. ; Hoel, V. ; De Jaeger, J.C. ; Defrance, N. ; Sury, C. ; Malbert, N. ; Labat, N. ; Curutchet, A. ; Dua, C. ; Oualli, M. ; Piazza, M. ; Bluet, J.M. ; Chikhaoui, W. ; Bru-Chevallier, C.
Author_Institution :
IEMN Inst. d´´Electron., Univ. Lille 1, Lille, France
fYear :
2010
fDate :
27-28 Sept. 2010
Firstpage :
114
Lastpage :
117
Abstract :
This work is a study of the degradation of AlGaN/GaN HEMTs generated by different ageing tests. The methodology is based on cross-characterisation analyses. The life tests (HTO 175°C, HTO 250°C, HTO 275°C and HTO 320°C) have mainly caused a strong decrease of the drain current at the very beginning of the test, then its partial recovery and finally its collapse. No evident degradation of the Schottky contact is observed after stress at different temperatures. Moreover, pulsed I-V measurements show an important evolution of gate lag and drain lag rates after ageing. Low frequency drain current noise increases after the life test and the highest the life test temperature, the highest the noise level increase.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; life testing; semiconductor device noise; semiconductor device testing; wide band gap semiconductors; AlGaN-GaN; HEMT; Schottky contact; cross-characterisation analysis; different ageing test; drain lag rate; gate lag; high electron mobility transistors; life test temperature; low frequency drain current noise; pulsed I-V measurement; temperature 175 degC; temperature 250 degC; temperature 275 degC; temperature 320 degC; temperature dependent degradation mode; Aging; Degradation; Gallium nitride; HEMTs; Logic gates; Temperature; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Integrated Circuits Conference (EuMIC), 2010 European
Conference_Location :
Paris
Print_ISBN :
978-1-4244-7231-4
Type :
conf
Filename :
5613725
Link To Document :
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