DocumentCode :
531429
Title :
Ultra low loss and high linearity SPMT antenna switch using SOI CMOS process
Author :
Ahn, Minsik ; Cha, Jeongwon ; Cho, Changhyuck ; Lee, Chang-Ho ; Laskar, Joy
Author_Institution :
Samsung Design Center, Atlanta, GA, USA
fYear :
2010
fDate :
28-30 Sept. 2010
Firstpage :
652
Lastpage :
655
Abstract :
Low loss and high linearity antenna switch is designed and implemented using 0.18 μm silicon-on-insulator(SOI) CMOS process for GSM/WCDMA mobile phone front-ends. Body-contacts(BC) NFETs from partially depleted (PD) SOI were chosen to implement low loss and high power antenna switch. The antenna switch employs a conventional multi-stacking FET structure to distribute voltage stress toward each FETs. Measurement results demonstrate less than 0.5 dB insertion loss up to 2 GHz and 80 dBc harmonics at all bands in the case of a single pole four throw(SP4T) switch design. This SP4T switch integrates controller to be used in the Tx module for GPRS/EDGE application. The controller operates from 3 V to 4.5 V. The design of antenna switches using multi-stack FETs can be extended by SP10T switch design with exceptional low loss and high linearity.
Keywords :
CMOS integrated circuits; antennas; cellular radio; code division multiple access; mobile radio; silicon-on-insulator; switches; GSM mobile phone front-end; NFET; SOI CMOS process; WCDMA mobile phone front-end; high linearity SPMT antenna switch; multistacking FET structure; silicon-on-insulator; size 0.18 micron; ultra low loss antenna switch; voltage 3 V to 4.5 V; voltage stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference (EuMC), 2010 European
Conference_Location :
Paris
Print_ISBN :
978-1-4244-7232-1
Type :
conf
Filename :
5616264
Link To Document :
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