Simulation on nanoimprint of grating structures

Author

Sun, Hongwen ; Liu, Guogao ; Lin, Shanming

Author_Institution

Coll. of Comput. & Inf. Eng., Hohai Univ., Changzhou, China

Volume

12

fYear

2010

fDate

22-24 Oct. 2010

Abstract

Nanoimprint lithography (NIL) is an important nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist. Fabricating gratings by NIL can manufacture lots of replica in a fast way. Simulation on the NIL process has a vital role on choosing optimized parameters. One finite element analysis software DEFORM was used to analyze different imprint factors. Through simulation optimization, it was found that imprint temperature, pressure and time strongly affected the replication fidelity. The simulation result will guide the NIL experiment.

Keywords

deformation; diffraction gratings; finite element analysis; nanolithography; optical fabrication; resists; soft lithography; NIL; finite element analysis; gratings; mechanical deformation; nanoimprint lithography; nanolithography; replication fidelity; resist; Analytical models; Computational modeling; Deformable models; Gratings; Nanolithography; Polymers; Resists; Simulation Optimization; grating; micro/nanostructures; nanoimprint; replication;

fLanguage

English

Publisher

ieee

Conference_Titel

Computer Application and System Modeling (ICCASM), 2010 International Conference on

Conference_Location

Taiyuan

Print_ISBN

978-1-4244-7235-2

Electronic_ISBN

978-1-4244-7237-6

Type

conf

DOI

10.1109/ICCASM.2010.5622281

Filename

5622281