DocumentCode
534139
Title
Comparative analysis of microwave low-barrier Mott and Schottky detector diodes
Author
Shashkin, V.I. ; Murel, A.V.
Author_Institution
Inst. for Phys. of Microstructures, RAS, Nizhny Novgorod, Russia
fYear
2010
fDate
13-17 Sept. 2010
Firstpage
829
Lastpage
830
Abstract
The effect of active layer homogeneous doping in a low-barrier metal-semiconductor contact with near-surface delta-doping on current and capacitance characteristics have been investigated. Difference in characteristics of diodes with Mott and Schottky contacts develops with increasing doping, which results in partial active layer depletion. For really important thickness of an active layer in microwave diodes this concentration can be estimated as 1015 cm-3. Exceeding of this doping level leads to increase of reverse current, decrease current nonlinearity and growth of contact capacitance. This results in reduced volt-watt sensitivity for a detector with low-barrier Schottky diodes comparing with Mott diodes.
Keywords
Schottky diodes; microwave detectors; semiconductor doping; Mott-Schottky detector diodes; active layer homogeneous doping; low barrier metal semiconductor contact; microwave low barrier detector; near surface delta doping; volt-watt sensitivity; Capacitance; Detectors; Doping; Microwave imaging; Schottky diodes; Sensitivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Telecommunication Technology (CriMiCo), 2010 20th International Crimean Conference
Conference_Location
Sevastopol
Print_ISBN
978-1-4244-7184-3
Type
conf
DOI
10.1109/CRMICO.2010.5633007
Filename
5633007
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