Title :
White-light transmission reflection interference technology application in three-dimensional reconstruction method validation for microstructures
Author :
Xue, Chenyang ; Liu, Jun ; Chou, Xiujian ; Liu, Yi ; Niu, Kangkang
Author_Institution :
Key Lab. of Instrum. Sci. & Dynamic, Meas., North Univ. of China, Taiyuan, China
Abstract :
In this paper the reconstructed method of three-dimensional morphology validated by the method of transmission reflection interference for GaAs steps structure, which is deposited by transparent film. As drove by Pizeo, the surface of different height can reach the position of zero optical path different, and during the whole of scanning, the change of interference fringe can be recorded by CCD, and then the three-dimensional morphology information of sample can be extracted. This technique of measurement has noncontact, nondestructive, high sensitivity and fast measurement characteristic. Relative indication error and relative repeatability error is controlled within the range of 5% respectively, according to the method of national metrology department.
Keywords :
III-V semiconductors; charge-coupled devices; gallium arsenide; micromechanical devices; CCD; GaAs; interference fringe; microstructures; three-dimensional morphology; three-dimensional reconstruction; transparent film; white-light transmission reflection interference technology; zero optical path; Gallium arsenide; Interference; Morphology; Optical films; Optical interferometry; Optical reflection; Optical variables measurement; reconstruction of three-dimensional morphology; scanning white light interference; transmission reflection interference; zero optical path different;
Conference_Titel :
Image and Signal Processing (CISP), 2010 3rd International Congress on
Conference_Location :
Yantai
Print_ISBN :
978-1-4244-6513-2
DOI :
10.1109/CISP.2010.5646874