Micromachining optical arrays

Author

Dunare, C. ; Parkes, W. ; Stevenson, T. ; Michette, A. ; Pfauntsch, S. ; Shand, M. ; Button, T. ; Sanmartin, D. Rodriguez ; Zhang, D. ; Feldman, C. ; Willingale, R. ; Doel, P. ; Wang, H. ; Smith, A. ; James, A.

Author_Institution

Scottish Microelectron. Centre, Univ. of Edinburgh, Edinburgh, UK

Volume

01

fYear

2010

fDate

11-13 Oct. 2010

Firstpage

155

Lastpage

158

Abstract

This paper describes two fabrication techniques-dry and wet etching for microstructured optical arrays (MOAs). The MOAs consist of arrays of channels deep etched in silicon. They use grazing incidence reflection to focus the X-rays through the consecutive aligned arrays of channels, ideally reflecting once off a vertical and smooth channel wall in each array. The MOAs were proposed by the Smart X-ray Optics (SXO) programme as small scale optics for micro-probing of biological cells and tissues. The first fabrication method requires inductively coupled plasma (ICP) using Bosch processes. The second one involves etching 〈110〉 silicon wafers in alkaline solutions.

Keywords

X-ray optics; biological techniques; biological tissues; cellular biophysics; elemental semiconductors; etching; micro-optics; micromachining; optical arrays; optical fabrication; silicon; Bosch processes; Si; X-rays; biological cells; biological tissues; grazing incidence reflection; inductively coupled plasma; micromachining; microprobing; microstructured optical arrays; silicon; smart X-ray optics; wet etching; Etching; Optical arrays; Optical device fabrication; Optical reflection; Silicon; X-rays; Bosch process; MOA; X-ray; alkaline solution; crystal planes; deep etch; roughness;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference (CAS), 2010 International

Conference_Location

Sinaia

ISSN

1545-827X

Print_ISBN

978-1-4244-5783-0

Type

conf

DOI

10.1109/SMICND.2010.5650215

Filename

5650215