DIffractive Microlenses With binary focal points on the optical axis

Author

Mihailescu, M. ; Sobetkii, A. ; Pelteacu, M.

Author_Institution

Politeh. Univ. from Bucharest, Bucharest, Romania

Volume

01

fYear

2010

fDate

11-13 Oct. 2010

Firstpage

113

Lastpage

116

Abstract

The aim of our study was to find a simple design for diffractive microlenses (DMLs) which will generate two focal points on the propagation axis at plane wave incidence. We investigate the influence of the missing central zones in the diffraction pattern. The fabrication steps include e-beam lithography (for mask pattern) and reactive ion etching (for transparent DMLs). To visualize their transparent binary microrelief and the phase profile, we employ the digital holographic microscopy technique. Experimental and simulation results are presented.

Keywords

diffractive optical elements; electron beam lithography; holography; light propagation; masks; microlenses; optical design techniques; optical fabrication; sputter etching; surface topography; transparency; binary focal points; central zones; diffractive microlenses; digital holographic microscopy; e-beam lithography; mask pattern; optical axis; phase profile; plane wave incidence; propagation axis; reactive ion etching; transparent binary microrelief; Holographic optical components; Holography; Lenses; Microoptics; Optical device fabrication; Optical diffraction; Optical refraction; Diffractive microlenses; Fresnel approximation; digital holographic microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference (CAS), 2010 International

Conference_Location

Sinaia

ISSN

1545-827X

Print_ISBN

978-1-4244-5783-0

Type

conf

DOI

10.1109/SMICND.2010.5650237

Filename

5650237