DocumentCode :
53852
Title :
Engineering Oxygen Vacancy of Tunnel Barrier and Switching Layer for Both Selectivity and Reliability of Selector-Less ReRAM
Author :
Sangheon Lee ; Daeseok Lee ; Jiyong Woo ; Euijun Cha ; Jaesung Park ; Hyunsang Hwang
Author_Institution :
Dept. of Mater. Sci. & Eng., Pohang Univ. of Sci. & Technol., Pohang, South Korea
Volume :
35
Issue :
10
fYear :
2014
fDate :
Oct. 2014
Firstpage :
1022
Lastpage :
1024
Abstract :
The resistive switching behaviors of selector-less resistive random access memory (ReRAM) have been extensively investigated to eliminate the tradeoff between selectivity and reliability. To achieve excellent selectivity, reliability should be sacrificed, and vice versa. The reason for this tradeoff is the narrow read operation margin of ReRAM having high selectivity. Therefore, the role of each layer has been analyzed and engineered to satisfy both selectivity and reliability requirements of the ReRAM. In the selector-less ReRAM, oxygen vacancies of the switching layer control set voltage for achieving high read operation margin, whereas oxygen vacancies of the tunnel barrier control selectivity.
Keywords :
integrated circuit reliability; random-access storage; engineering oxygen vacancy; high-read operation margin; narrow read operation margin; resistive random access memory; resistive switching behavior; selectorless ReRAM reliability; selectorless ReRAM selectivity; switching layer; switching layer control set voltage; tunnel barrier control selectivity; Hafnium compounds; Reliability engineering; Reservoirs; Switches; Tunneling; ReRAM; reliability; selectivity;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2014.2347925
Filename :
6891220
Link To Document :
بازگشت