• DocumentCode
    53934
  • Title

    Design, Simulation, and Characterization of a Bimorph Varifocal Micromirror and Its Application in an Optical Imaging System

  • Author

    Li Li ; Ran Li ; Lubeigt, Walter ; Uttamchandani, Deepak

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Univ. of Strathclyde, Glasgow, UK
  • Volume
    22
  • Issue
    2
  • fYear
    2013
  • fDate
    Apr-13
  • Firstpage
    285
  • Lastpage
    294
  • Abstract
    A 1.2-mm-diameter gold-silicon bimorph varifocal micromirror (VFM) has been designed and investigated for imaging applications. Several prototypes have been fabricated in a 10-μm-thick single-crystal silicon-on-insulator material. Controlled variation of the radius of curvature using electrothermal and optothermal actuation has been demonstrated. A finite-element-based simulation of the device behavior has been undertaken. Experimental characterization has shown that the device focusing power varied from an initial 87 dioptre to 69 dioptre by applying dc electrical power of 33 mW and produced a focusing power value of 59 dioptre when optothermally actuated with a normally incident laser beam of 488-nm wavelength and 43 mW. When electrothermally driven, the mechanical rise and fall times of the device were measured as 130 and 120 ms, respectively. Experimental and theoretical analyses using Zernike coefficients show that, throughout the actuation range, the aberration of the VFM is mainly a small defocus term, with negligible higher order aberrations. A compact active imaging system incorporating the VFM has been also demonstrated. This system was capable of focusing several objects located along the optical axis with a maximum tracking range of 134 mm.
  • Keywords
    aberrations; finite element analysis; gold; integrated optics; micromirrors; optical design techniques; optical focusing; silicon; silicon-on-insulator; Zernike coefficients; bimorph varifocal micromirror; device focusing; electrothermal actuation; finite element based simulation; higher order aberrations; optical axis; optical imaging system; optothermal actuation; power 33 mW; power 43 mW; single crystal silicon-on-insulator material; size 1.2 mm; size 10 mum; wavelength 488 nm; Gold; Measurement by laser beam; Micromirrors; Optical imaging; Optical surface waves; Optical variables measurement; Silicon; Imaging; Silicon-on-Insulator Multi-User-MEMS Processes (SOIMUMPs); thermal actuation; varifocal micromirror (VFM);
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2012.2220337
  • Filename
    6328231