• DocumentCode
    539361
  • Title

    Going green with on-site generated fluorine: Sustainable cleaning agent for CVD processes

  • Author

    Stockman, Paul ; Shuttleworth, Greg

  • Author_Institution
    Linde Electronics, 1575 Mountain Avenue, Murray Hill, NJ 07974, USA
  • fYear
    2008
  • fDate
    27-29 Oct. 2008
  • Firstpage
    355
  • Lastpage
    358
  • Abstract
    On-site generated fluorine meets the sustainability requirements for the future of CVD thin-film process chamber cleaning. Rigorous industry safety standards are maintained, GWP and total carbon footprint impacts are greatly reduced, and significant process improvements are available.
  • Keywords
    Cleaning; Gases; Hafnium; Plasmas; Production; Safety; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2008 International Symposium on
  • Conference_Location
    Tokyo, Japan
  • ISSN
    1523-553X
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5714878