DocumentCode
539380
Title
A Scanner Throughput Monitoring System (STMS) for continuously improving litho-cluster productivity
Author
Chen, Wei Tai ; Lin, Pin Chun ; Wu, Ta Wei
Author_Institution
UMC, Hsinchu City, Taiwan, ROC
fYear
2008
fDate
27-29 Oct. 2008
Firstpage
155
Lastpage
158
Abstract
The litho-cluster is the main manufacturing equipment in a semiconductor Fab. Manufacturers have difficulty in clarifying the root cause of productivity variation within the litho-cluster because of various factors in determining the productivity and the complex wafer motion system. Hence, the “Scanner Throughput Monitoring System” (STMS) was developed by UMC in order to monitor the productivity variations, quickly identify the possible causes of the bottleneck, and take the corresponding actions to improve productivity.
Keywords
Data models; Lithography; Monitoring; Productivity; Throughput; Tracking;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location
Tokyo, Japan
ISSN
1523-553X
Electronic_ISBN
1523-553X
Type
conf
Filename
5714901
Link To Document