DocumentCode :
539380
Title :
A Scanner Throughput Monitoring System (STMS) for continuously improving litho-cluster productivity
Author :
Chen, Wei Tai ; Lin, Pin Chun ; Wu, Ta Wei
Author_Institution :
UMC, Hsinchu City, Taiwan, ROC
fYear :
2008
fDate :
27-29 Oct. 2008
Firstpage :
155
Lastpage :
158
Abstract :
The litho-cluster is the main manufacturing equipment in a semiconductor Fab. Manufacturers have difficulty in clarifying the root cause of productivity variation within the litho-cluster because of various factors in determining the productivity and the complex wafer motion system. Hence, the “Scanner Throughput Monitoring System” (STMS) was developed by UMC in order to monitor the productivity variations, quickly identify the possible causes of the bottleneck, and take the corresponding actions to improve productivity.
Keywords :
Data models; Lithography; Monitoring; Productivity; Throughput; Tracking;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
ISSN :
1523-553X
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5714901
Link To Document :
بازگشت