• DocumentCode
    539380
  • Title

    A Scanner Throughput Monitoring System (STMS) for continuously improving litho-cluster productivity

  • Author

    Chen, Wei Tai ; Lin, Pin Chun ; Wu, Ta Wei

  • Author_Institution
    UMC, Hsinchu City, Taiwan, ROC
  • fYear
    2008
  • fDate
    27-29 Oct. 2008
  • Firstpage
    155
  • Lastpage
    158
  • Abstract
    The litho-cluster is the main manufacturing equipment in a semiconductor Fab. Manufacturers have difficulty in clarifying the root cause of productivity variation within the litho-cluster because of various factors in determining the productivity and the complex wafer motion system. Hence, the “Scanner Throughput Monitoring System” (STMS) was developed by UMC in order to monitor the productivity variations, quickly identify the possible causes of the bottleneck, and take the corresponding actions to improve productivity.
  • Keywords
    Data models; Lithography; Monitoring; Productivity; Throughput; Tracking;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2008 International Symposium on
  • Conference_Location
    Tokyo, Japan
  • ISSN
    1523-553X
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5714901