Title :
Advanced endpoint detection tool of NF3 remote plasma cleaning
Author :
Fujii, Kazuyuki ; Hanazaki, Minoru ; Kawaharada, Gen ; Katayama, Katsuo ; Komemura, Toshio ; Taki, Masakazu ; Tuda, Mutumi
Author_Institution :
Renesas Technology Corp., 751 Horiguchi, Hitachinaka, Ibaraki 312-8504, Japan
Abstract :
We have developed an advanced endpoint detection (EPD) tool of NF3 remote plasma cleaning for CVD chambers in order to improve cleaning condition, or manage the endpoint regularly. The EPD tool has simple structure and easy maintenance with high cost performance. In this paper, it is reported that we have confirmed this tool realizing the stable EPD over 7 months at plasma-SiO CVD chambers for mass production.
Keywords :
Cleaning; Electrodes; Films; Maintenance engineering; Mass production; Plasma measurements; Plasmas;
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
Electronic_ISBN :
1523-553X
