DocumentCode
539394
Title
Advanced endpoint detection tool of NF3 remote plasma cleaning
Author
Fujii, Kazuyuki ; Hanazaki, Minoru ; Kawaharada, Gen ; Katayama, Katsuo ; Komemura, Toshio ; Taki, Masakazu ; Tuda, Mutumi
Author_Institution
Renesas Technology Corp., 751 Horiguchi, Hitachinaka, Ibaraki 312-8504, Japan
fYear
2008
fDate
27-29 Oct. 2008
Firstpage
287
Lastpage
290
Abstract
We have developed an advanced endpoint detection (EPD) tool of NF3 remote plasma cleaning for CVD chambers in order to improve cleaning condition, or manage the endpoint regularly. The EPD tool has simple structure and easy maintenance with high cost performance. In this paper, it is reported that we have confirmed this tool realizing the stable EPD over 7 months at plasma-SiO CVD chambers for mass production.
Keywords
Cleaning; Electrodes; Films; Maintenance engineering; Mass production; Plasma measurements; Plasmas;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location
Tokyo, Japan
ISSN
1523-553X
Electronic_ISBN
1523-553X
Type
conf
Filename
5714915
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