• DocumentCode
    539404
  • Title

    APC - The consequent next step

  • Author

    Brüggemann, Michael ; Lippl, Gerhard

  • Author_Institution
    Infineon Technologies AG Regensburg, Wernerwerkstrasse 2, 93049, Germany
  • fYear
    2008
  • fDate
    27-29 Oct. 2008
  • Firstpage
    227
  • Lastpage
    230
  • Abstract
    A high performing process control system is the key for facing the challenges in chip manufacturing for automotive industry. Increasing requirements on products and product quality drive the evolution of standards for process control. A lot of effort is spent by Infineon to bring its process control systems to perfection. Historically, the four disciplines FDC (Fault detection and classification), R2R (Run to Run control), Sensors and Metrology are used more or less separately to work on specific problems on semiconductor processing equipment and semiconductors. Every of these disciplines have its own advantages and disadvantages and its own target window in a wafer fab.
  • Keywords
    Databases; Manufacturing; Metrology; Monitoring; Process control; Production; Sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2008 International Symposium on
  • Conference_Location
    Tokyo, Japan
  • ISSN
    1523-553X
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5714925