DocumentCode :
539404
Title :
APC - The consequent next step
Author :
Brüggemann, Michael ; Lippl, Gerhard
Author_Institution :
Infineon Technologies AG Regensburg, Wernerwerkstrasse 2, 93049, Germany
fYear :
2008
fDate :
27-29 Oct. 2008
Firstpage :
227
Lastpage :
230
Abstract :
A high performing process control system is the key for facing the challenges in chip manufacturing for automotive industry. Increasing requirements on products and product quality drive the evolution of standards for process control. A lot of effort is spent by Infineon to bring its process control systems to perfection. Historically, the four disciplines FDC (Fault detection and classification), R2R (Run to Run control), Sensors and Metrology are used more or less separately to work on specific problems on semiconductor processing equipment and semiconductors. Every of these disciplines have its own advantages and disadvantages and its own target window in a wafer fab.
Keywords :
Databases; Manufacturing; Metrology; Monitoring; Process control; Production; Sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
ISSN :
1523-553X
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5714925
Link To Document :
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