DocumentCode
539408
Title
Prediction of film thickness of Bottom Anti-reflective Coating based on in-line viscosity measurement
Author
Chang, Woo Sok ; Monovoukas, Christos ; Kahmann, Keith ; Arjona, Manuel ; Shi, Hang ; Collins, Darin ; Buschjost, Ryan
Author_Institution
Levitronix LLC, 45 First Ave., Waltham, MA 02451, USA
fYear
2008
fDate
27-29 Oct. 2008
Firstpage
59
Lastpage
61
Abstract
Tighter fim thickness control is required as the linewidth of semiconductor devices gets smaller. Viscosity is one of the most important parameters to determine film thickness during spin coating. In this paper, we show strong and repeatable correlation between viscosity and film thickness for a Bottom Anti-reflective Coating (BARC) material. Based on results of this work, we have developed a mathematical model, which allows Process Engineers to predict film thicknes by measuring the viscosity of the material. It is now possible to automatically target a desired film thickness of BARC onto the wafer by targeting BARC viscosity during manufacturing.
Keywords
Coatings; Feedback control; Films; Temperature control; Viscosity; Film thickness prediction; in-line viscometer; photoresist production; viscosity control;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location
Tokyo, Japan
ISSN
1523-553X
Electronic_ISBN
1523-553X
Type
conf
Filename
5714929
Link To Document