• DocumentCode
    539408
  • Title

    Prediction of film thickness of Bottom Anti-reflective Coating based on in-line viscosity measurement

  • Author

    Chang, Woo Sok ; Monovoukas, Christos ; Kahmann, Keith ; Arjona, Manuel ; Shi, Hang ; Collins, Darin ; Buschjost, Ryan

  • Author_Institution
    Levitronix LLC, 45 First Ave., Waltham, MA 02451, USA
  • fYear
    2008
  • fDate
    27-29 Oct. 2008
  • Firstpage
    59
  • Lastpage
    61
  • Abstract
    Tighter fim thickness control is required as the linewidth of semiconductor devices gets smaller. Viscosity is one of the most important parameters to determine film thickness during spin coating. In this paper, we show strong and repeatable correlation between viscosity and film thickness for a Bottom Anti-reflective Coating (BARC) material. Based on results of this work, we have developed a mathematical model, which allows Process Engineers to predict film thicknes by measuring the viscosity of the material. It is now possible to automatically target a desired film thickness of BARC onto the wafer by targeting BARC viscosity during manufacturing.
  • Keywords
    Coatings; Feedback control; Films; Temperature control; Viscosity; Film thickness prediction; in-line viscometer; photoresist production; viscosity control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2008 International Symposium on
  • Conference_Location
    Tokyo, Japan
  • ISSN
    1523-553X
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5714929