DocumentCode :
539408
Title :
Prediction of film thickness of Bottom Anti-reflective Coating based on in-line viscosity measurement
Author :
Chang, Woo Sok ; Monovoukas, Christos ; Kahmann, Keith ; Arjona, Manuel ; Shi, Hang ; Collins, Darin ; Buschjost, Ryan
Author_Institution :
Levitronix LLC, 45 First Ave., Waltham, MA 02451, USA
fYear :
2008
fDate :
27-29 Oct. 2008
Firstpage :
59
Lastpage :
61
Abstract :
Tighter fim thickness control is required as the linewidth of semiconductor devices gets smaller. Viscosity is one of the most important parameters to determine film thickness during spin coating. In this paper, we show strong and repeatable correlation between viscosity and film thickness for a Bottom Anti-reflective Coating (BARC) material. Based on results of this work, we have developed a mathematical model, which allows Process Engineers to predict film thicknes by measuring the viscosity of the material. It is now possible to automatically target a desired film thickness of BARC onto the wafer by targeting BARC viscosity during manufacturing.
Keywords :
Coatings; Feedback control; Films; Temperature control; Viscosity; Film thickness prediction; in-line viscometer; photoresist production; viscosity control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
ISSN :
1523-553X
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5714929
Link To Document :
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