• DocumentCode
    539433
  • Title

    Detection of non visible Poly leakage defect by e-beam inspection

  • Author

    Ito, Shinya ; Matsushita, Yana ; Nagatani, Go

  • Author_Institution
    Spansion Japan Limited, Aizuwakamatsu-Shi, Fukushima, Japan
  • fYear
    2008
  • fDate
    27-29 Oct. 2008
  • Firstpage
    76
  • Lastpage
    78
  • Abstract
    E-beam inspection (EBI) was used on a Poly Voltage Contrast (PVC) structure to detect a non-visible Poly to Poly leakage defect on production wafers. The Voltage Contrast signature that EBI detected strongly correlated with electrical leakage test result. e-beam inspection on Poly Voltage Contrast structure significantly reduces the time for the defect root cause analysis.
  • Keywords
    Capacitors; Electric potential; Electron beams; Equivalent circuits; Inspection; Integrated circuit modeling; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2008 International Symposium on
  • Conference_Location
    Tokyo, Japan
  • ISSN
    1523-553X
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5714955
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=539433