DocumentCode
539439
Title
Qualification of inline FIB for production — A comprehensive “BEOL” contamination study
Author
Sledz, Michael ; Baptiste, Burchell ; Pearl, Haim ; Porat, Ronnie ; Levin, Jacob
Author_Institution
Spansion, 5204 East Ben White Blvd. 78741 Austin, TX USA
fYear
2008
fDate
27-29 Oct. 2008
Firstpage
375
Lastpage
378
Abstract
In-line FIB (Focused Ion Beam) systems have become an important tool for failure analysis in the chip manufacturing production line. A general problem that in-line FIB users face is how to qualify returning wafers to production after FIB milling. In this paper we will present a set of experiments defined for qualifying in-line FIB production work in a 90nm generation FLASH production fab. The effect of FIB cuts on further process steps, cross tool contamination, the impact on yield and parametric testing were studied and will be discussed.
Keywords
Contamination; Copper; Gallium; Manufacturing; Pollution measurement; Production; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location
Tokyo, Japan
ISSN
1523-553X
Electronic_ISBN
1523-553X
Type
conf
Filename
5714961
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