• DocumentCode
    540407
  • Title

    Dielectric charging in capacitive RF MEMS switches: The effect of electric stress

  • Author

    Tavassolian, Negar ; Koutsoureli, Matroni ; Papaioannou, George ; Lacroix, Benjamin ; Papapolymerou, John

  • Author_Institution
    Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2010
  • fDate
    7-10 Dec. 2010
  • Firstpage
    1833
  • Lastpage
    1836
  • Abstract
    This paper investigates the dependence of dielectric charging on the pull-in state electric field and temperature in capacitive RF MEMS switches with silicon dioxide as the dielectric material. Electric field intensities determined by bias levels extending from 0% to 50% above pull-in voltage are employed. Experimental results indicate that charging is thermally activated and the activation energy increases with increasing the intensity of the pull-in state electric field. These results provide a deeper insight to the trapping processes in dielectric materials under different levels of electric stress and aid in better modeling of charging processes in capacitive RF MEMS switches.
  • Keywords
    dielectric materials; electric field effects; microswitches; silicon compounds; activation energy; bias level; capacitive RF MEMS switches; dielectric charging; dielectric material; electric stress; pull-in state electric field; pull-in voltage; silicon dioxide; temperature; Capacitance; Europe; Micromechanical devices; Physics; Switches; Testing; Thickness measurement; Capacitive switches; RF MEMS; dielectric charging; electric stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference Proceedings (APMC), 2010 Asia-Pacific
  • Conference_Location
    Yokohama
  • Print_ISBN
    978-1-4244-7590-2
  • Electronic_ISBN
    978-1-902339-22-2
  • Type

    conf

  • Filename
    5728284