Microwave based plasma technology

Thin film deposition based on plasma CVD processes are well known for many years. While these processes mainly drove the miniaturization of wafer based micro electronics, the upscale was for a long time of minor interest. With the increasing activations in photovoltaic devices or flat panel displays, the homogeneous large area deposition became more important. This paper will contribute to handle large area and high rate deposition with plasma CVD based on a linear plasma line concept with microwave excitation. The lines are arranged in a lateral extended plasma source and the first experience in deposition is introduced.