Title :
Normally-off AlGaN/GaN HFET with p-type GaN gate and AlGaN buffer
Author :
Hilt, Oliver ; Knauer, Arne ; Brunner, Frank ; Bahat-Treidel, Eldad ; Würfl, Joachim
Author_Institution :
Ferdinand-Braun-Inst., Leibniz-Inst. fuer Hoechstfrequenztechnik, Berlin, Germany
Abstract :
A 1.5 A normally-off GaN transistor for power applications in p-type GaN gate technology with a modified epitaxial concept is presented. A higher threshold voltage is achieved while keeping the on-state resistance low by using an Al-GaN buffer instead of a GaN buffer. Additionally, the AlGaN buffer acts as a back-barrier and suppresses source-drain punch-through currents in the off-state. P-GaN gate GaN transistors with AlGaN buffer will therefore yield higher breakdown voltages as compared to standard GaN buffer versions which results in an excellent VBr-to-RON ratio. The proposed normally-off technology shows save operation under elevated ambient temperature up to 200 °C without thermal runaway. In contrast to standard normally-on AlGaN/GaN HEMTs, a reverse diode operation is possible for offstate conditions which may enable improved inverter circuits.
Keywords :
III-V semiconductors; aluminium compounds; buffer layers; gallium compounds; high electron mobility transistors; semiconductor epitaxial layers; wide band gap semiconductors; AlGaN-GaN; back-barrier; buffer; elevated ambient temperature; modified epitaxial concept; normally-off HFET; normally-off transistor; on-state resistance; p-type gate; power applications; reverse diode operation; size 1.5 A; threshold voltage; Aluminum gallium nitride; Gallium nitride; HEMTs; Leakage current; Logic gates; MODFETs;
Conference_Titel :
Integrated Power Electronics Systems (CIPS), 2010 6th International Conference on
Conference_Location :
Nuremberg
Print_ISBN :
978-1-61284-814-3